Purity 99.95% 

 
　　Specification
　　●To customer’s specification

　　Manufacturing Process
　　●Processed by vacuum induction melting, cold rolling and machining. Clean with ultrasonic cleaning equipment and vacuum sealed.
　　PTF
　　●We use high PTF process to ensure our target has better sputtering performance
　　Grain Size
　　●Grain size of Co Target is tightly controlled to customer requirements, typically within 100 microns.